US 12,468,134 B2
Pattern projecting apparatus for use in a three-dimensional imaging arrangement
Pavel Grinberg, Netanya (IL); Alan Geller, Kfar Yona (IL); and Mishel Ivgi, Yehud-Monoson (IL)
Assigned to INUITIVE LTD., Ra'anana (IL)
Filed by Inuitive Ltd., Raanana (IL)
Filed on Oct. 12, 2021, as Appl. No. 17/498,997.
Prior Publication US 2023/0112460 A1, Apr. 13, 2023
Int. Cl. G02B 19/00 (2006.01); G02B 5/00 (2006.01); G03B 21/14 (2006.01); G03B 21/20 (2006.01)
CPC G02B 19/0047 (2013.01) [G02B 5/005 (2013.01); G03B 21/14 (2013.01); G03B 21/2053 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A pattern projecting apparatus comprising at least one light source, at least one projection lens, at least one mask and configured to enable the at least one projection lens to project a pattern, and
wherein said pattern projecting apparatus is characterized in that the at least one light source is a wide area light source, and
wherein the area of the at least one mask or the at least one mask active area, is smaller than the area of the at least one light source,
thereby enabling to refrain from applying condenser optics or focusing optics between the at least one light source and the at least one mask.