US 12,468,079 B2
Polarizing plate and optical display apparatus comprising the same
Jin Woo Kim, Suwon-si (KR); Ki Yong Kim, Suwon-si (KR); Kyoung Min Cho, Suwon-si (KR); and Dong Ho Wee, Suwon-si (KR)
Assigned to Wuxi Hengxin Optoelectronic Materials Co., Ltd., Wuxi (CN)
Filed by SAMSUNG SDI CO., LTD., Yongin-si (KR)
Filed on Apr. 17, 2023, as Appl. No. 18/301,752.
Claims priority of application No. 10-2022-0051352 (KR), filed on Apr. 26, 2022.
Prior Publication US 2023/0341601 A1, Oct. 26, 2023
Int. Cl. G02B 5/30 (2006.01); G02F 1/1335 (2006.01)
CPC G02B 5/305 (2013.01) [G02F 1/133528 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A polarizing plate comprising:
a polarizer; and
a patterned portion comprising a first resin layer and a second resin layer stacked on at least one surface of the polarizer, the first resin layer having a different index of refraction from the second resin layer,
wherein the first resin layer is a patterned layer comprising: multiple first optical patterns formed at intervals at an interface with the second resin layer; and one or more second optical patterns formed between each pair of adjacent first optical patterns,
a first optical pattern of the multiple first optical patterns has two opposite side surfaces each at least comprising a first side surface having a base angle, and
the first optical pattern and a second optical pattern of the one or more second optical patterns satisfy the following Relations 1 to 3:
0.1 μm≤m2≤m1×0.2,  (1)
0.1 μm≤w2≤w1×0.5,  (2)
0.1 μm≤h2≤h1×0.2,  (3)
where m1 is a minimum width (unit: μm) between the opposite first side surfaces of the first optical pattern,
w1 is a maximum width (unit: μm) between the opposite first side surfaces of the first optical pattern,
h1 is a minimum distance (unit: μm) between the minimum width and the maximum width of the first optical pattern,
m2 is a maximum width (unit: μm) of a second surface formed at a top portion of the second optical pattern,
w2 is a maximum width (unit: μm) of the second optical pattern, and
h2 is a maximum height (unit: μm) of the second optical pattern.