| CPC C25D 1/003 (2013.01) [B33Y 10/00 (2014.12); B33Y 30/00 (2014.12)] | 20 Claims |

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1. An electrochemical-additive manufacturing system comprising:
a system controller;
a deposition power supply;
deposition control circuits electrically coupled to the deposition power supply and communicatively coupled to and individually controlled by the system controller;
an electrode array comprises individually-addressable electrodes, each electrically coupled to one of the deposition control circuits;
a deposition electrode, electrically coupled to the deposition power supply and forming a gap with the electrode array;
a membrane positioned within the gap between the deposition electrode and electrode array, wherein the membrane is configured to transmit protons through the membrane and to block at least metal ions from being transmitted through the membrane; and
a membrane-support subsystem, positioned outside of the gap between the deposition electrode and electrode array, engaging and supporting the membrane in between the deposition electrode and electrode array, wherein the membrane-support subsystem is configured to move the membrane relative to the electrode array in at least one direction, parallel to a membrane-facing surface of the electrode array.
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