US 12,467,136 B2
Process characterization and correction using optical wall process sensor (OWPS)
Jeffrey Yat Shan Au, Sunnyvale, CA (US); Sidharth Bhatia, Santa Cruz, CA (US); Zhaozhao Zhu, Milpitas, CA (US); Nicholas Ryan Pica, Meridian, ID (US); Varoujan Chakarian, San Jose, CA (US); and Chenfei Hu, Cupertino, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 16, 2022, as Appl. No. 17/696,794.
Prior Publication US 2023/0295799 A1, Sep. 21, 2023
Int. Cl. G01N 21/01 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); G01N 21/84 (2006.01); G01N 21/94 (2006.01)
CPC C23C 16/4401 (2013.01) [C23C 16/52 (2013.01); G01N 21/01 (2013.01); G01N 21/94 (2013.01); G01N 2021/0181 (2013.01); G01N 2021/8416 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method, comprising:
receiving, by a processing device, first data from an optical sensor of a processing chamber, wherein the first data is collected while the processing chamber is under operating conditions;
obtaining reference state data from the optical sensor, collected while the processing chamber is in a reference state which is different from the operating conditions;
determining a reference sensor response of the optical sensor based on the reference state data;
correcting the first data to generate corrected first data based on the reference sensor response of the optical sensor;
processing the corrected first data to obtain second data, wherein the second data comprises an indication of a condition of a coating on an interior surface of the processing chamber;
generating an indication of performance of a first processing operation of the processing chamber in view of the second data; and
causing performance of a corrective action in response to the indication of performance of the first processing operation of the processing chamber, the corrective action comprising providing a signal to cause the processing chamber to end a second processing operation in accordance with an updated chamber endpoint condition based on the indication of performance.