US 12,467,127 B2
Molybdenum monolithic physical vapor deposition target
Jianxin Lei, Fremont, CA (US); Kirankumar Neelasandra Savandaiah, Bangalore (IN); Andrew Moe, Santa Clara, CA (US); and Madan Kumar Shimoga Mylarappa, Bangalore (IN)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 9, 2024, as Appl. No. 18/799,515.
Claims priority of provisional application 63/536,230, filed on Sep. 1, 2023.
Prior Publication US 2025/0075309 A1, Mar. 6, 2025
Int. Cl. C23C 14/34 (2006.01); H01J 37/34 (2006.01)
CPC C23C 14/3414 (2013.01) [H01J 37/3423 (2013.01); H01J 37/3426 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A physical vapor deposition (PVD) target, comprising:
a monolithic molybdenum target comprising:
a support region partially defined by a process face and radial sidewalls;
a mounting region disposed radially outward of the support region, the mounting region defined by an upper face and a mounting face, the radial sidewalls disposed between the upper face and the process face;
a height between about 0.85 inches and about 1.1 inches, the height defined between the process face and the mounting face; and
a recess disposed within the mounting face of the monolithic molybdenum target, the recess disposed opposite the process face and extending radially outward of the radial sidewalls, the recess comprising a recess radius; and
a coating disposed on a recess face of the recess, the recess radius, and extending a width onto the mounting face.