US 12,467,018 B2
Cleaning and polishing fluid and method of using
Feng Bai, Woodbury, MN (US); Sarah L. Hagen, Inver Grove Heights, MN (US); and Matthew P. Guay, Minneapolis, MN (US)
Assigned to 3M INNOVATIVE PROPERTIES COMPANY, St. Paul, MN (US)
Appl. No. 17/624,632
Filed by 3M INNOVATIVE PROPERTIES COMPANY, St. Paul, MN (US)
PCT Filed Jul. 8, 2020, PCT No. PCT/IB2020/056428
§ 371(c)(1), (2) Date Jan. 4, 2022,
PCT Pub. No. WO2021/005533, PCT Pub. Date Jan. 14, 2021.
Claims priority of provisional application 62/871,583, filed on Jul. 8, 2019.
Prior Publication US 2022/0275309 A1, Sep. 1, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C11D 3/08 (2006.01); B08B 3/04 (2006.01); C11D 3/12 (2006.01); C11D 3/37 (2006.01)
CPC C11D 3/3765 (2013.01) [C11D 3/1246 (2013.01); C11D 2111/14 (2024.01); C11D 2111/44 (2024.01)] 20 Claims
OG exemplary drawing
 
1. A cleaning and polishing fluid, comprising:
water;
a wetting agent based on N-octyl-2-pyrrolidone;
a polymer; and
a silicate;
wherein the water is greater than 98 wt % of the fluid and wherein the cleaning and polishing fluid is suitable for use with a moving abrasive pad on hard floor surfaces to clean the hard floor surfaces wherein the hard floor surface comprises a coated stone floor, a coated vinyl floor, a coated tile vinyl composition tile floor, or a solid vinyl tile floor.