	US 12,466,960 B2
	Resin composition, film, and multilayer structure
Ryohei Kobayashi, Tokyo (JP); Takuya Nakajima, Tokyo (JP); and Keisuke Takeshita, Tokyo (JP)
Assigned to MITSUBISHI CHEMICAL CORPORATION, Tokyo (JP)
Filed by MITSUBISHI CHEMICAL CORPORATION, Tokyo (JP)
Filed on Sep. 23, 2021, as Appl. No. 17/482,885.
Application 17/482,885 is a continuation of application No. PCT/JP2020/014351, filed on Mar. 27, 2020.
Claims priority of application No. 2019-067446 (JP), filed on Mar. 29, 2019; application No. 2019-067447 (JP), filed on Mar. 29, 2019; application No. 2019-197103 (JP), filed on Oct. 30, 2019; application No. 2019-216942 (JP), filed on Nov. 29, 2019; application No. 2019-237755 (JP), filed on Dec. 27, 2019; and application No. 2019-237756 (JP), filed on Dec. 27, 2019.
Prior Publication US 2022/0010143 A1, Jan. 13, 2022
Int. Cl. C09D 5/00 (2006.01); C08F 16/06 (2006.01); C08J 5/18 (2006.01); C08K 5/098 (2006.01); C09D 7/63 (2018.01); C09D 101/28 (2006.01); C09D 129/04 (2006.01)

CPC C09D 5/00 (2013.01) [C08F 16/06 (2013.01); C08J 5/18 (2013.01); C09D 7/63 (2018.01); C09D 101/28 (2013.01); C09D 129/04 (2013.01); C08J 2329/04 (2013.01); C08K 5/098 (2013.01)]

12 Claims

1. A resin composition, comprising:

a hydrophilic resin and a metal compound, the metal compound being a lamellar metal compound represented by the following chemical formula (4):

M_a(OH)_bA^n-_(2a-b)/n (4)

wherein:

M is a metal species,

A is ROCO,

R is an alkyl chain represented by a chemical formula C_mH_2m+1where m=1 to 20 and optionally has a functional group,

n is an integer not less than 1, and

a and b are numbers greater than zero and satisfy an expression a/b=0.1 to 10, and satisfying the following expression (1) when being formed into a film:

α1−β1≥1 (1)

wherein:

α1 is an average metal atom concentration (%) in a portion of the film in a depth range of 0 to 9 nm from a film surface, and

β1 is an average metal atom concentration (%) in a portion of the film in a depth range of 12 to 21 nm from the film surface.