| CPC B23K 26/0622 (2015.10) [A61B 18/26 (2013.01); A61P 13/12 (2018.01); B23K 26/0853 (2013.01); B23K 26/40 (2013.01); H01S 3/06716 (2013.01); H01S 3/1616 (2013.01); A61B 2018/263 (2013.01)] | 20 Claims |

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1. A waveform control device for a laser lithotripsy apparatus, comprising:
a processor comprising hardware, the processor being configured to:
control a laser beam source to emit a laser beam having a pulse train of a frequency at which a bubble is generated in a solution to connect a laser emission end and a crushing target, the laser beam being emitted at a predetermined repetition frequency;
obtain transmission waveform of the laser beam;
determine, from the transmission waveform, a time at which transmittance of the laser beam decreases after reaching a predetermined level, wherein the time corresponds to an estimated time at which the bubble, that connected the laser emission end and the crushing target, contracts such that the bubble does not couple the laser emission end and the crushing target;
set, based on the determined time at which the transmittance of the laser beam decreases after reaching the predetermined level, an adjusted repetition frequency of the pulse train to decrease a period between when the laser beam source is controlled to reduce an output of the laser beam at the end of the pulse train and the time at which transmittance of the laser beam decreases after reaching the predetermined level; and
control the laser beam source to emit the next laser beam having the pulse train at the adjusted repetition frequency.
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