| CPC B05B 13/0242 (2013.01) | 10 Claims |
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1. A substrate processing apparatus comprising:
a process chamber having a processing space defined therein to process a plurality of substrates;
a gas injector provided on a upper side of the process chamber to inject a processing gas into the processing space;
a plurality of substrate supports arranged inside the process chamber to face the gas injector, the plurality of substrates being seated on the plurality of substrate supports;
a substrate conveyor disposed in the process chamber to convey the plurality of substrates seated on the substrate supports to different substrate supports among the substrate supports; and
a substrate rotating part arranged to allow each of the plurality of substrates to be seated between neighboring substrate supports among the plurality of substrate supports, and to rotate the plurality of seated substrates,
wherein the substrate rotating part comprises:
a drive shaft disposed at a lower portion of the process chamber to be rotationally driven about a center axis;
a rotating plate connected to the drive shaft to rotate with rotation of the drive shaft, the rotating plate comprising a plurality of rotating seats allowing the plurality of substrates to be seated thereon;
a power transmitter connecting the drive shaft and the rotating plate to allow a rotational force of the drive shaft to be transmitted to the rotating plate; and
a tension adjuster disposed on at least a portion of the power transmitter to adjust a tension in the power transmitter connecting the drive shaft and the rotating plate.
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