US 12,136,938 B2
Closed-loop multiple-output radio frequency (RF) matching
Eller Y. Juco, San Jose, CA (US); and Karl Frederick Leeser, West Linn, OR (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Appl. No. 17/594,906
Filed by Lam Research Corporation, Fremont, CA (US)
PCT Filed Apr. 30, 2020, PCT No. PCT/US2020/030835
§ 371(c)(1), (2) Date Nov. 2, 2021,
PCT Pub. No. WO2020/227028, PCT Pub. Date Nov. 12, 2020.
Claims priority of provisional application 62/844,668, filed on May 7, 2019.
Prior Publication US 2022/0190854 A1, Jun. 16, 2022
Int. Cl. H04B 1/04 (2006.01); G01R 27/06 (2006.01); H01J 37/32 (2006.01)
CPC H04B 1/0483 (2013.01) [G01R 27/06 (2013.01); H01J 37/32183 (2013.01); H01J 37/32935 (2013.01); H01J 2237/3321 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for providing signals to stations of a process chamber configured to perform plasma-based semiconductor fabrication processes, comprising:
a plurality of signal generators configured to generate signals having first and second frequencies;
a measurement circuit configured to measure a voltage standing wave ratio (VSWR); and
a match reflection optimizer having a plurality of output ports each corresponding to a station of a plurality of stations of the process chamber, the match reflection optimizer comprising a reactive component configured to be adjusted responsive to an output signal from the measurement circuit.