US 12,136,682 B2
Device integration using carrier wafer
Devendra K. Sadana, Pleasantville, NY (US); Ning Li, White Plains, NY (US); Ghavam G. Shahidi, Pound Ridge, NY (US); Frank Robert Libsch, White Plains, NY (US); and Stephen W. Bedell, Wappingers Falls, NY (US)
Assigned to International Business Machines Corporation, Armonk, NY (US)
Filed by International Business Machines Corporation, Armonk, NY (US)
Filed on Sep. 29, 2021, as Appl. No. 17/489,706.
Prior Publication US 2023/0116053 A1, Apr. 13, 2023
Int. Cl. H01L 31/12 (2006.01); H01L 31/18 (2006.01); H01L 33/00 (2010.01)
CPC H01L 31/125 (2013.01) [H01L 31/184 (2013.01); H01L 33/0062 (2013.01)] 2 Claims
OG exemplary drawing
 
1. An optoelectronic assembly comprising:
a carrier substrate including an electrically insulating surface;
an optoelectronic structure bonded to the electrically insulating surface of the carrier substrate, the optoelectronic structure including:
a first semiconductor layer having a first conductivity type;
an intrinsic semiconductor layer on the first semiconductor layer; and
a second semiconductor layer on the intrinsic semiconductor layer and having a second conductivity type, the second conductivity type being opposite from the first conductivity type, the intrinsic semiconductor layer being between the first semiconductor layer and the second semiconductor layer;
wherein:
one of the first semiconductor layer and the second semiconductor layer is bonded to the electrically insulating surface of the carrier substrate;
the substrate comprises sapphire; and
the optoelectronic structure comprises a III-V structure including light-emitting diodes;
further comprising:
a photovoltaic structure bonded to the electrically insulating surface of the carrier substrate, the photovoltaic structure comprising:
a first doped layer comprising silicon;
an intrinsic layer comprising silicon on the first doped layer; and
a second doped layer comprising silicon and on the intrinsic layer, the second doped layer and first doped layer have opposite conductivity types; and
a region, with gallium nitride devices, on the substrate.