US 12,136,544 B2
Etch uniformity improvement for single turn internal coil PVD chamber
Anthony Chih-Tung Chan, Sunnyvale, CA (US); Adolph Miller Allen, Oakland, CA (US); Mehul Chauhan, Santa Clara, CA (US); and Goichi Yoshidome, Albany, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jul. 14, 2022, as Appl. No. 17/865,144.
Claims priority of provisional application 63/276,493, filed on Nov. 5, 2021.
Prior Publication US 2023/0141298 A1, May 11, 2023
Int. Cl. H01J 37/34 (2006.01); C23C 14/35 (2006.01)
CPC H01J 37/3452 (2013.01) [C23C 14/35 (2013.01); H01J 37/3417 (2013.01); H01J 2237/3323 (2013.01)] 20 Claims
OG exemplary drawing
 
16. A process chamber, comprising:
a chamber body coupled to a lid to define an interior volume therein;
a pedestal disposed in the interior volume for supporting a substrate;
a coil disposed in the interior volume above the pedestal; and
an external magnet assembly disposed above the coil, comprising:
a housing coupled atop the chamber body, wherein the housing includes a plate having a central opening and an inner lip extending upward from the central opening;
two arcuate base plates coupled to an upper surface of the housing; and
a plurality of magnets disposed external to the chamber body coupled to the housing via the two arcuate base plates and arranged asymmetrically about the chamber body, wherein the plurality of magnets are arranged in a plurality of magnet sets disposed radially outward of the inner lip.