| CPC H01J 37/32183 (2013.01) [H03H 7/40 (2013.01); H01J 37/32091 (2013.01); H01J 37/321 (2013.01)] | 20 Claims |
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1. A radio frequency (RF) impedance matching unit adapted for coupling between an RF power generator and a plasma processing chamber, comprising:
an RF tuning circuit having a first node adapted for coupling to an RF power generator, a second node adapted for coupling to a plasma processing chamber, and adjustable tuning elements for transforming an output resistance of the RF power generator into a plurality of impedances at the second node;
a match controller coupled to the adjustable tuning elements of the RF tuning circuit, wherein the match controller controls and monitors positions of the adjustable tuning elements of the RF tuning circuit;
a first communications interface coupled to the match controller for receiving position information for and transmitting position information of the adjustable tuning elements of the RF tuning circuit; and
an RF impedance measurement module coupled between the second node of the RF tuning circuit and the plasma processing chamber, the RF impedance measurement module comprising:
a frequency detector having an input coupled to the second node;
an RF phase detector;
a microcontroller having inputs that are configured to receive signal information from outputs of the frequency detector and the RF phase detector; and
a second communications interface coupled to the microcontroller and adapted for communicating measured frequency and RF phase.
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