US 12,136,534 B2
Voltage waveform generator for plasma assisted processing apparatuses
Jordi Everts, Son en Breugel (NL); and Noud Slaats, Son en Breugel (NL)
Assigned to PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V., Son en Breugel (NL)
Appl. No. 18/005,326
Filed by PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V., Son en Breugel (NL)
PCT Filed Jul. 6, 2021, PCT No. PCT/EP2021/068697
§ 371(c)(1), (2) Date Jan. 12, 2023,
PCT Pub. No. WO2022/013017, PCT Pub. Date Jan. 20, 2022.
Claims priority of application No. 2026071 (NL), filed on Jul. 15, 2020.
Prior Publication US 2023/0260753 A1, Aug. 17, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32128 (2013.01) [H01J 37/321 (2013.01); H01J 37/32146 (2013.01); H01J 37/32174 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A voltage waveform generator for a plasma assisted processing apparatus, the voltage waveform generator comprising:
a common node,
a voltage waveform generation circuit operably connected to the common node and configured to apply a voltage signal at the common node, and
a current source operably connected to the common node and configured to apply a DC current at the common node,
wherein the current source comprises:
a first switch node connected to the common node through a first inductor, and
a first power supply comprising at least two first voltage nodes, connected to the first switch node,
wherein the current source is operable to switch between the at least two first voltage nodes at the first switch node.