US 12,136,533 B2
Antenna mechanism and plasma processing device
Yasunori Ando, Kyoto (JP); and Daisuke Matsuo, Kyoto (JP)
Assigned to NISSIN ELECTRIC CO., LTD., Kyoto (JP)
Appl. No. 17/797,434
Filed by NISSIN ELECTRIC CO., LTD., Kyoto (JP)
PCT Filed Mar. 10, 2020, PCT No. PCT/JP2020/010350
§ 371(c)(1), (2) Date Aug. 4, 2022,
PCT Pub. No. WO2021/181531, PCT Pub. Date Sep. 16, 2021.
Prior Publication US 2023/0063182 A1, Mar. 2, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/3211 (2013.01) 13 Claims
OG exemplary drawing
 
1. An antenna mechanism for generating plasma, comprising:
an antenna body through which a high-frequency current flows; and
a plurality of adjustment circuits through which a secondary current generated as an induced current caused by the high-frequency current flowing through the antenna body,
wherein each of the plurality of adjustment circuits has a metal conductor and a capacitive element constituting a closed circuit.