US 12,135,540 B2
Devices and methods for examining and/or processing an element for photolithography
Michael Budach, Hanau (DE); Nicole Auth, Ginsheim-Gustavsburg (DE); Christian Rensing, Bensheim (DE); Alexander Freytag, Erfurt (DE); and Christian Wojek, Aalen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Dec. 11, 2020, as Appl. No. 17/119,053.
Application 17/119,053 is a continuation of application No. PCT/EP2019/065195, filed on Jun. 11, 2019.
Claims priority of application No. 102018209562.0 (DE), filed on Jun. 14, 2018.
Prior Publication US 2021/0132594 A1, May 6, 2021
Int. Cl. G05B 19/4155 (2006.01); G03F 1/68 (2012.01); G03F 1/72 (2012.01); G03F 1/74 (2012.01); G03F 1/86 (2012.01); H01J 37/302 (2006.01); H01J 37/317 (2006.01)
CPC G05B 19/4155 (2013.01) [G03F 1/68 (2013.01); G03F 1/72 (2013.01); G03F 1/74 (2013.01); G03F 1/86 (2013.01); H01J 37/302 (2013.01); H01J 37/317 (2013.01); H01J 37/3174 (2013.01); G05B 2219/45028 (2013.01); G05B 2219/45031 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A device for examining and/or processing an element for photolithography with a beam of charged particles, comprising:
a. means for acquiring measurement data while the element for photolithography is exposed to the beam of charged particles;
b. means for predetermining a drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter, wherein the trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data; and
c. means for correcting at least one defect of the element for photolithography with the beam of charged particles and at least one precursor gas.