US 12,135,502 B2
Resin, photoresist composition, and method of manufacturing semiconductor device
Siao-Shan Wang, Tainan (TW); Ching-Yu Chang, Yuansun Village (TW); and Chin-Hsiang Lin, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Aug. 8, 2023, as Appl. No. 18/231,444.
Application 18/231,444 is a division of application No. 17/220,705, filed on Apr. 1, 2021.
Claims priority of provisional application 63/017,881, filed on Apr. 30, 2020.
Prior Publication US 2023/0393467 A1, Dec. 7, 2023
Int. Cl. G03F 7/038 (2006.01); C08L 25/08 (2006.01); C08L 33/10 (2006.01); C08L 33/16 (2006.01); G03F 7/004 (2006.01); G03F 7/027 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01)
CPC G03F 7/0388 (2013.01) [C08L 33/16 (2013.01); G03F 7/0045 (2013.01); G03F 7/027 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/40 (2013.01); C08L 25/08 (2013.01); C08L 33/10 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A photoresist composition, comprising:
a photoactive compound; and
a resin comprising a radical-active functional group and an acid labile group,
wherein the radical-active functional group is an alkene group or an alkyne group,
wherein the resin further comprises one or more linker groups connecting the radical-active functional group to the resin, and
wherein the linker groups include an electron-withdrawing group, and the electron-withdrawing group is one or more selected from the group consisting of

OG Complex Work Unit Chemistry
wherein R is a C1-C10 linear, branched, or cyclic alkyl group.
 
8. A resin, comprising monomer units having a radical-active functional group and an acid labile group,
wherein the radical-active functional group is an alkene group or an alkyne group, and
wherein the resin comprises one or more monomer units selected from the group consisting of:

OG Complex Work Unit Chemistry
 
13. A photoresist composition, comprising:
a photoactive compound; and
a resin including a radical-active functional group, an acid labile group, and a sensitizer group,
wherein the radical-active functional group is an alkene group or an alkyne group,
the radical-active functional group is connected to the sensitizer group by a first linker group,
the resin further comprises one or more second linker groups connecting the radical-active functional group to the resin, and
the first and second linker groups are electron-withdrawing groups selected from the group consisting of

OG Complex Work Unit Chemistry
wherein R is a C1-C10 linear, branched, or cyclic alkyl group.