US 12,135,211 B2
Device for measuring a substrate and method for correcting cyclic error components of an interferometer
Stephan Zschaeck, Weissendorf (DE); Uwe Horn, Rudolstadt (DE); Thomas Kutzner, Cospeda (DE); and Oliver Jaeckel, Jena (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on May 5, 2022, as Appl. No. 17/737,209.
Application 17/737,209 is a continuation of application No. PCT/EP2020/081694, filed on Nov. 11, 2020.
Claims priority of application No. 102019130696.5 (DE), filed on Nov. 14, 2019.
Prior Publication US 2022/0260359 A1, Aug. 18, 2022
Int. Cl. G01B 9/02056 (2022.01); G01B 9/02015 (2022.01); G01B 9/02055 (2022.01); G03F 7/00 (2006.01)
CPC G01B 9/02059 (2013.01) [G01B 9/02015 (2013.01); G01B 9/0207 (2013.01); G03F 7/7085 (2013.01); G03F 7/70883 (2013.01); G03F 7/70933 (2013.01); G01B 2290/60 (2013.01); G01B 2290/70 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A device for measuring a substrate for semiconductor lithography with a measurement interferometer for measuring a position of the substrate, wherein the device comprises a reference interferometer for ascertaining a change in ambient conditions within an enclosure containing the substrate to correct the position measured by the measurement interferometer,
wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer.