US 12,134,823 B2
Method for controlling a processing system
Andreas Neuber, Stuttgart (DE)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jul. 1, 2022, as Appl. No. 17/856,613.
Application 17/856,613 is a continuation of application No. 16/544,334, filed on Aug. 19, 2019, granted, now 11,396,699.
Application 16/544,334 is a continuation of application No. 15/138,818, filed on Apr. 26, 2016, granted, now 10,428,420, issued on Oct. 1, 2019.
Claims priority of provisional application 62/159,074, filed on May 8, 2015.
Prior Publication US 2022/0333238 A1, Oct. 20, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01)
CPC C23C 16/4412 (2013.01) [C23C 16/45502 (2013.01); C23C 16/45512 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An apparatus for controlling a processing system, comprising:
a controller configured to:
receive a metric indicative of a flow rate of a first gas flowing into a processing chamber;
in response to the received metric, send a signal to a subfab component to inject an inert gas directly into an exhaust line at a location between the processing chamber and an abatement system downstream of the processing chamber;
determine a change in the flow rate of the first gas flowing into the processing chamber; and
change a flow rate of the inert gas injected directly into the exhaust line by the subfab component in proportion to the change in the flow rate of the first gas flowing into the processing chamber, wherein a proportionality of the flow rate of the inert gas to the flow rate of the first gas flowing into the processing chamber is dynamically adjusted.
 
10. A method for controlling a processing system, comprising:
receiving a metric indicative of a flow rate of a first gas flowing into a processing chamber;
in response to the received metric, sending a signal to a subfab component to inject an inert gas directly into an exhaust line at a location between the processing chamber and an abatement system downstream of the processing chamber;
determine a change in the flow rate of the first gas flowing into the processing chamber; and
change a flow rate of the inert gas injected directly into the exhaust line by the subfab component in proportion to the change in the flow rate of the first gas flowing into the processing chamber, wherein a proportionality of the flow rate of the inert gas to the flow rate of the first gas flowing into the processing chamber is dynamically adjusted.