US 12,134,817 B2
Corrosion resistant and low embrittlement aluminum alloy coatings on steel by magnetron sputtering
Stephen P. Gaydos, St. Louis, MO (US); Vijaykumar S. Ijeri, Bangalore (IN); Om Prakash, Bangalore (IN); Suman K. Mishra, Jamshedpur (IN); Raghuvir Singh, Jamshedpur (IN); Sharma Paswan, Jamshedpur (IN); and Lokesh C. Pathak, Jamshedpur (IN)
Assigned to THE BOEING COMPANY, Arlington, VA (US)
Filed by THE BOEING COMPANY, Chicago, IL (US)
Filed on Feb. 27, 2020, as Appl. No. 16/803,797.
Application 16/803,797 is a division of application No. 15/678,757, filed on Aug. 16, 2017, granted, now 10,577,686.
Claims priority of application No. 201711020234 (IN), filed on Jun. 9, 2017.
Prior Publication US 2020/0208255 A1, Jul. 2, 2020
Int. Cl. C23C 14/34 (2006.01); C22C 21/00 (2006.01); C22C 21/06 (2006.01); C22C 21/10 (2006.01); C22C 21/16 (2006.01); C23C 14/16 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01); C22F 1/04 (2006.01)
CPC C23C 14/165 (2013.01) [C22C 21/00 (2013.01); C22C 21/06 (2013.01); C22C 21/10 (2013.01); C22C 21/16 (2013.01); C23C 14/3414 (2013.01); C23C 14/345 (2013.01); C23C 14/3485 (2013.01); C23C 14/35 (2013.01); C23C 14/352 (2013.01); H01J 37/3426 (2013.01); C22F 1/04 (2013.01); H01J 37/3467 (2013.01); Y10T 428/12757 (2015.01)] 32 Claims
OG exemplary drawing
 
1. A method of magnetron sputtering an aluminum alloy (Currently Amended) coating onto a substrate, the method comprising:
flowing a sputter gas to a processing region of a process chamber, the process chamber having an aluminum alloy sputter target comprising one or more of:
about 1 wt % to about 15 wt % zinc based on the total weight of the alloy,
about 1 wt % to about 10 wt % magnesium based on the total weight of the alloy, or
about 0.1 wt % to about 5 wt % zirconium based on the total weight of the alloy;
applying a magnetic field of about 200 Gauss to about 300 Gauss to the process chamber;
delivering a plurality of energy pulses to the sputter gas, each pulse of the plurality of energy pulses comprising a non-square wave shape, wherein each pulse of the plurality of energy pulses comprises a different amount of power and a different time duration; and
depositing the aluminum alloy coating onto the substrate at a deposition rate of about 2 micrometers per hour to about 3 micrometers per hour by applying a positive target bias voltage of about 200 V to about 1,000 V relative to an anode and a deposition pressure of 4×10−3 mbar to 6×10−3 mbar to produce an alloy coating having a percent total pore volume of about 5% or less and an average pore diameter of about 10 microns or less.