US 12,134,108 B2
Vapor phase deposition of organic films
Viljami J. Pore, Helsinki (FI); Marko Tuominen, Helsinki (FI); and Hannu Huotari, Helsinki (FI)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP HOLDING B.V., Almere (NL)
Filed on Apr. 14, 2023, as Appl. No. 18/300,748.
Application 18/300,748 is a continuation of application No. 17/820,180, filed on Aug. 16, 2022.
Application 17/820,180 is a continuation of application No. 16/877,129, filed on May 18, 2020, granted, now 11,446,699, issued on Sep. 20, 2022.
Application 16/877,129 is a continuation of application No. 14/879,962, filed on Oct. 9, 2015, granted, now 10,695,794, issued on Jun. 30, 2020.
Prior Publication US 2023/0249217 A1, Aug. 10, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); B05D 1/00 (2006.01); H10K 71/16 (2023.01)
CPC B05D 1/60 (2013.01) [C23C 16/45525 (2013.01); H10K 71/164 (2023.02)] 22 Claims
OG exemplary drawing
 
1. An apparatus for organic film deposition, comprising:
a vessel configured to vaporize an organic reactant to form a reactant vapor;
a reaction space configured to accommodate a substrate and in selective fluid communication with the vessel; and
a control system configured to:
maintain the reactant in the vessel at a temperature A;
maintain the substrate at a temperature B, wherein the temperature B is between about 5° C. and about 50° C. lower than the temperature A;
transport the reactant vapor from the vessel to the substrate; and
deposit an organic film on the substrate while maintaining the reactant in the vessel at the temperature A and maintaining the substrate at the temperature B.