CPC B05D 1/60 (2013.01) [C23C 16/45525 (2013.01); H10K 71/164 (2023.02)] | 22 Claims |
1. An apparatus for organic film deposition, comprising:
a vessel configured to vaporize an organic reactant to form a reactant vapor;
a reaction space configured to accommodate a substrate and in selective fluid communication with the vessel; and
a control system configured to:
maintain the reactant in the vessel at a temperature A;
maintain the substrate at a temperature B, wherein the temperature B is between about 5° C. and about 50° C. lower than the temperature A;
transport the reactant vapor from the vessel to the substrate; and
deposit an organic film on the substrate while maintaining the reactant in the vessel at the temperature A and maintaining the substrate at the temperature B.
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