US 12,464,833 B2
Avalanche photodetectors with a combined lateral and vertical arrangement
Khee Yong Lim, Singapore (SG); Kian Ming Tan, Singapore (SG); and Kiok Boone Elgin Quek, Singapore (SG)
Assigned to GlobalFoundries Singapore Pte. Ltd., Singapore (SG)
Filed by GlobalFoundries Singapore Pte. Ltd., Singapore (SG)
Filed on Nov. 10, 2022, as Appl. No. 17/984,564.
Prior Publication US 2024/0162365 A1, May 16, 2024
Int. Cl. H10F 30/225 (2025.01); H10F 71/00 (2025.01); H10F 77/122 (2025.01); H10F 77/20 (2025.01)
CPC H10F 30/2255 (2025.01) [H10F 71/121 (2025.01); H10F 77/122 (2025.01); H10F 77/206 (2025.01)] 20 Claims
OG exemplary drawing
 
1. A structure for an avalanche photodetector, the structure comprising:
a substrate having a first conductivity type;
a first semiconductor layer that defines an absorption region of the avalanche photodetector;
a first contact connected to the substrate;
a second contact connected to a side edge portion of the first semiconductor layer;
a dielectric layer between the first semiconductor layer and the substrate;
a charge control region comprising a semiconductor material having a second conductivity type opposite to the first conductivity type and a different bandgap from the first semiconductor layer; and
a second semiconductor layer that extends through the dielectric layer from the charge control region to the substrate,
wherein the second semiconductor layer defines a multiplication region.