| CPC H01L 24/45 (2013.01) [H01L 2224/45147 (2013.01); H01L 2924/01203 (2013.01); H01L 2924/20751 (2013.01); H01L 2924/20752 (2013.01); H01L 2924/20753 (2013.01); H01L 2924/20754 (2013.01); H01L 2924/20755 (2013.01); H01L 2924/20756 (2013.01); H01L 2924/20757 (2013.01); H01L 2924/20758 (2013.01); H01L 2924/20759 (2013.01); H01L 2924/2076 (2013.01)] | 5 Claims |
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1. A copper bonding wire for semiconductor devices, wherein a density of crystal grain boundary on a surface of the wire is 0.6 (μm/μm2) or more and 1.6 (μm/μm2) or less,
wherein the density of crystal grain boundary refers to a total length (μm) of a crystal grain boundary that is present per unit area (μm2),
wherein the density of crystal grain boundary on the surface of the wire is calculated by dividing the total length (μm) of the crystal grain boundary by a measurement area (μm2), where the crystal grain boundary is defined as a boundary at which an orientation difference between adjacent measurement points is 15° or more when measuring by using an EBSD method at measurement point intervals of 0.06 μm or more and 0.6 μm or less, and
wherein the density of crystal grain boundary on the surface of the wire is measured under the condition that a center of width of a measuring surface is aligned with a center of width of the wire in a direction perpendicular to a longitudinal axis of the wire, the width of the measuring surface is 20% or more and 40% or less of a diameter of the wire, and a length of the measuring surface is five times the width of the measuring surface.
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