| CPC H01L 21/68785 (2013.01) [B08B 3/041 (2013.01); H01L 21/67023 (2013.01); H01R 39/08 (2013.01); H01R 39/18 (2013.01); H01L 21/6708 (2013.01); H01L 21/67115 (2013.01); H01L 21/68728 (2013.01); H01L 21/6875 (2013.01); H01L 21/68792 (2013.01); H01R 39/42 (2013.01)] | 20 Claims |

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1. An apparatus for treating a substrate, the apparatus comprising:
a processing vessel having a processing space;
a support unit for supporting the substrate in the processing space and rotating the substrate;
a liquid supply unit for supplying a processing liquid to the substrate supported by the support unit; and
a heating unit for heating the substrate,
wherein the support unit includes:
a spin chuck;
a rotation driver for rotating the spin chuck;
a chuck pin installed on the spin chuck so as to be rotated together with the spin chuck; and
a chuck pin moving unit including a cam ring, a cam ring driver for rotating the cam ring, and a slip-ring assembly for providing power to the cam ring driver, wherein the chuck pin moving unit is configured for moving the chuck pin between a contact position at which the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and
the chuck pin moving unit moves the chuck pin while the substrate is rotated by the spin chuck.
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