US 12,463,063 B2
Substrate cleaning device
Takuma Takahashi, Kyoto (JP); Tomoyuki Shinohara, Kyoto (JP); Junichi Ishii, Kyoto (JP); Kazuki Nakamura, Kyoto (JP); Takashi Shinohara, Kyoto (JP); Nobuaki Okita, Kyoto (JP); and Yoshifumi Okada, Kyoto (JP)
Assigned to SCREEN HOLDINGS CO., LTD., (JP)
Appl. No. 18/579,208
Filed by SCREEN HOLDINGS CO., LTD., Kyoto (JP)
PCT Filed Jun. 30, 2022, PCT No. PCT/JP2022/026392
§ 371(c)(1), (2) Date Jan. 12, 2024,
PCT Pub. No. WO2023/286635, PCT Pub. Date Jan. 19, 2023.
Claims priority of application No. 2021-117423 (JP), filed on Jul. 15, 2021.
Prior Publication US 2024/0321598 A1, Sep. 26, 2024
Int. Cl. H01L 21/67 (2006.01); B08B 1/12 (2024.01); B08B 1/34 (2024.01)
CPC H01L 21/67046 (2013.01) [B08B 1/12 (2024.01); B08B 1/34 (2024.01)] 6 Claims
OG exemplary drawing
 
1. A substrate cleaning device comprising:
a substrate holder that holds a substrate in a horizontal attitude;
a lower-surface brush that is configured to be movable between a processing position for cleaning of the substrate and a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and rotatable about an axis extending in the up-and-down direction, and cleans a lower surface of the substrate by coming into contact with the lower surface of the substrate;
a first liquid nozzle that discharges a cleaning liquid to a center portion of the lower-surface brush, at the waiting position; and
a second liquid nozzle that discharges a cleaning liquid to an end portion of the lower-surface brush, at the waiting position.