US 12,463,012 B2
High-frequency power supply system
Yuya Ueno, Osaka (JP); and Yuichi Hasegawa, Osaka (JP)
Assigned to DAIHEN Corporation, Osaka (JP)
Filed by DAIHEN Corporation, Osaka (JP)
Filed on Dec. 26, 2023, as Appl. No. 18/396,451.
Claims priority of application No. 2022-212633 (JP), filed on Dec. 28, 2022.
Prior Publication US 2024/0222076 A1, Jul. 4, 2024
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32146 (2013.01) [H01J 37/32155 (2013.01); H01J 37/32183 (2013.01)] 3 Claims
OG exemplary drawing
 
1. A high-frequency power supply system comprising:
a first power supply configured to output a first forward wave voltage having a first fundamental frequency;
a second power supply configured to output a second forward wave voltage having a second fundamental frequency lower than the first fundamental frequency;
a first matcher connected between the first power supply and a load; and
a second matcher connected between the second power supply and the load, wherein
the second power supply performs pulse modulation of repeating an ON operation of outputting the second forward wave voltage and an OFF operation of not outputting the second forward wave voltage, and
the first power supply performs frequency modulation control in a second power supply ON period in which the ON operation is performed, and performs frequency offset control of outputting a third forward wave voltage having a third fundamental frequency obtained by adding an offset frequency to the first fundamental frequency in a second power supply OFF period in which the OFF operation is performed.