US 12,463,011 B2
Inductively coupled plasma source with radial coil network
Yuhui Zhang, Sunnyvale, CA (US); Yang Yang, Cupertino, CA (US); Zhimin Jiang, Santa Clara, CA (US); Kartik Ramaswamy, San Jose, CA (US); and Alok Ranjan, Sunnyvale, CA (US)
Assigned to Applied Materials Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 11, 2023, as Appl. No. 18/388,821.
Prior Publication US 2025/0157791 A1, May 15, 2025
Int. Cl. H01J 37/32 (2006.01); H01L 21/3065 (2006.01)
CPC H01J 37/3211 (2013.01) [H01J 37/32183 (2013.01); H01L 21/3065 (2013.01); H01J 2237/3341 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for generating plasma inductively in a process chamber, comprising:
a radial coil network with a planar structure configured to inductively generate plasma in the process chamber, including:
an inner conductor with an open center, wherein at least one RF power source is electrically connected to the inner conductor at a power node;
an outer conductor spaced away from and surrounding the inner conductor, wherein at least one ground is electrically connected to the outer conductor at a ground node;
a plurality of branch conductors extending from the inner conductor to the outer conductor, wherein the plurality of branch conductors are distributed uniformly in the radial coil network; and
a plurality of capacitors, wherein at least one capacitor of the plurality of capacitors is electrically interposed into each branch conductor of the plurality of branch conductors.