US 12,463,003 B2
High temperature ion source
Shu Satoh, Byfield, MA (US); and Neil Colvin, Merrimack, NH (US)
Assigned to Axcelis Technologies, Inc., Beverly, MA (US)
Filed by Axcelis Technologies, Inc., Beverly, MA (US)
Filed on Jan. 28, 2025, as Appl. No. 19/039,069.
Claims priority of provisional application 63/627,292, filed on Jan. 31, 2024.
Prior Publication US 2025/0246396 A1, Jul. 31, 2025
Int. Cl. H01J 37/09 (2006.01); H01J 37/08 (2006.01); H01J 37/34 (2006.01)
CPC H01J 37/09 (2013.01) [H01J 37/08 (2013.01); H01J 37/3447 (2013.01)] 16 Claims
OG exemplary drawing
 
1. An arc chamber for an ion source, the arc chamber comprising:
a source of thermal radiation positioned within an interior region of the arc chamber;
one or more components generally enclosing the interior region of the arc chamber, therein defining an arc chamber environment within the interior region of the arc chamber, wherein a first of the one or more components comprises an extraction aperture plate having an extraction aperture defined therethrough; and
one or more thermal radiation shields positioned between the one or more components and an external environment directly outside of the arc chamber, whereby the one or more thermal radiation shields limit a transfer of the thermal radiation from the arc chamber environment to the external environment, wherein the one or more thermal radiation shields and the extraction aperture plate are comprised of the same material.