| CPC G06F 30/373 (2020.01) [G06F 17/16 (2013.01); G06F 30/367 (2020.01); H01L 23/427 (2013.01); H01L 25/162 (2013.01); H01L 25/165 (2013.01); G06F 2113/18 (2020.01); G06F 2115/06 (2020.01); G06F 2115/12 (2020.01); G06F 2119/02 (2020.01); G06F 2119/06 (2020.01); G06F 2119/08 (2020.01); G06F 2119/22 (2020.01); H01L 24/16 (2013.01); H01L 2224/16225 (2013.01); H01L 2924/1433 (2013.01); H01L 2924/1437 (2013.01); H01L 2924/1616 (2013.01); H01L 2924/16196 (2013.01); H01L 2924/16235 (2013.01); H01L 2924/16251 (2013.01); H01L 2924/1627 (2013.01); H01L 2924/351 (2013.01); H01L 2924/37001 (2013.01)] | 25 Claims |

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1. A method of making a semiconductor device, comprising:
calculating a thermal resistance matrix for the semiconductor device;
selecting a plurality of maximum junction temperatures for a plurality of die of the semiconductor device;
calculating a plurality of power envelope surfaces for the semiconductor device based on the thermal resistance matrix and maximum junction temperatures;
selecting a plurality of powers for the plurality of die; and
comparing the plurality of powers against the plurality of power envelope surfaces to determine a plurality of risk values.
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