US 12,461,455 B2
Cleaning method, computer storage medium, and substrate treatment system
Hayato Kikuchi, Boise, ID (US)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jul. 3, 2023, as Appl. No. 18/346,419.
Prior Publication US 2025/0013159 A1, Jan. 9, 2025
Int. Cl. G03F 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01)
CPC G03F 7/70916 (2013.01) [G03F 7/70925 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for cleaning a supply flow path connected to a discharger which discharges a treatment solution to a substrate, the method comprising:
(A) supplying a cleaning solution to the discharger via the supply flow path and discharging the cleaning solution from the discharger; and
(B) estimating whether or not cleaning has been completed, based on a detection result by a foreign substance detector configured to detect foreign substances in the cleaning solution supplied to the supply flow path, wherein
the (B) comprises:
(C) estimating a cleaning completion point where the detection result by the foreign substance detector stabilizes as a total discharge amount of the cleaning solution is increasing, based on a history of the detection result by the foreign substance detector; and
(D) estimating whether or not the cleaning has been completed, based on the estimated cleaning completion point.