US 12,461,449 B2
Systems and methods for lithographic tools with increased tolerances
Jasper Winters, Vieuw Vennep (NL); John Erwin Van Zwer, Pijnacker (NL); Johannes Marcus Van Der Lans, Hillegom (NL); Willem Herman Pieter De Jager, Middelbeers (NL); and Anton Emiel Van De Ven, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 18/577,035
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Jun. 17, 2022, PCT No. PCT/EP2022/066578
§ 371(c)(1), (2) Date Jan. 5, 2024,
PCT Pub. No. WO2023/001458, PCT Pub. Date Jan. 26, 2023.
Claims priority of application No. 21186587 (EP), filed on Jul. 20, 2021.
Prior Publication US 2025/0021012 A1, Jan. 16, 2025
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70275 (2013.01) [G03F 7/70366 (2013.01); G03F 7/70475 (2013.01); G03F 7/70525 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of use for a lithographic tool, the method comprising:
scanning a substrate relative to a first micro-lens array (MLA) and a second MLA, wherein each of the first MLA and second MLA has a plurality of rows of lenslets, wherein the first MLA has functional lenslets and extra lenslets, and wherein the scanning comprises delivering light through the lenslets of the first MLA and second MLA to the substrate, the delivering including:
delivering light through the functional lenslets to form a pattern on the substrate, the pattern having gaps caused by a positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA, and
delivering light through the extra lenslets to fill the gaps in the pattern.