US 12,461,448 B2
Multi-channel light source for projection optics heating
Laurentius Johannes Adrianus Van Bokhoven, Bergeijk (NL); and Mahesh Upendra Ajgaonkar, Guilford, CT (US)
Assigned to ASML NETHERLANDS B.V. & ASML HOLDING N.V., Veldhoven (NL)
Appl. No. 18/273,618
Filed by ASML Netherlands B.V., Veldhoven (NL); and ASML Holding N.V., Veldhoven (NL)
PCT Filed Dec. 30, 2021, PCT No. PCT/EP2021/087888
§ 371(c)(1), (2) Date Jul. 21, 2023,
PCT Pub. No. WO2022/161736, PCT Pub. Date Aug. 4, 2022.
Claims priority of provisional application 63/142,131, filed on Jan. 27, 2021.
Prior Publication US 2024/0077803 A1, Mar. 7, 2024
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/702 (2013.01) [G03F 7/70166 (2013.01); G03F 7/70208 (2013.01); G03F 7/70891 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A system, comprising:
a radiation redistribution system configured to provide radiation to heat a plurality of mirrors, wherein the radiation redistribution system comprises:
an optical input channel configured to receive an input radiation beam from a radiation source;
a radiation splitting system configured to generate a plurality of output radiation beams based on the input radiation beam;
a plurality of optical output channels configured to transmit the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of mirrors,
wherein the plurality of heater head optics comprises:
a plurality of preheaters configured to thermally condition one or more mirrors of the plurality of mirrors when not exposed to EUV radiation, and
a plurality of sector heaters configured to thermally condition the one or more mirrors of the plurality of mirrors during and/or after exposure to EUV radiation; and
a controller coupled to the plurality of preheaters and the plurality of sector heaters to control operation of the respective thermal conditioning.