US 12,461,446 B2
Illumination optical system, exposure apparatus and method of manufacturing article
Daisuke Kobayashi, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Apr. 29, 2022, as Appl. No. 17/733,021.
Claims priority of application No. 2021-079243 (JP), filed on May 7, 2021.
Prior Publication US 2022/0357659 A1, Nov. 10, 2022
Int. Cl. G03F 7/20 (2006.01); G02B 26/08 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/201 (2013.01) [G02B 26/0875 (2013.01); G03F 7/7055 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An illumination optical system for illuminating an original using linearly polarized light that is p-polarized light, in scanning exposure of a substrate, comprising:
a first light-transmissive member arranged on an optical path of the linearly polarized light, and
a second light-transmissive member arranged on an optical path of the linearly polarized light which has been transmitted through the first light-transmissive member,
wherein, in the scanning exposure:
the substrate is scanned to be accelerated and then be decelerated,
one of the first and second light-transmissive members is driven to increase a first incident angle at which the linearly polarized light is incident on the one, and the other of the first and second light-transmissive members is driven to decrease a second incident angle at which the linearly polarized light is incident on the other, and
the first light-transmissive member and the second light-transmissive member are driven in accordance with a scanning speed of the substrate, such that each of the first incident angle and the second incident angle is a Brewster's angle when the scanning speed of the substrate is maximum.