US 12,461,399 B2
Method for manufacturing an electro-optical device and electro-optical device
Daniel Schall, Aachen (DE); and Galip Reha Hepgüler, Aachen (DE)
Assigned to Black Semiconductor GmbH, Aachen (DE)
Appl. No. 17/796,357
Filed by Black Semiconductor GmbH, Aachen (DE)
PCT Filed Dec. 17, 2020, PCT No. PCT/EP2020/086611
§ 371(c)(1), (2) Date Jul. 29, 2022,
PCT Pub. No. WO2021/151584, PCT Pub. Date Aug. 5, 2021.
Claims priority of application No. 102020102533.5 (DE), filed on Jan. 31, 2020.
Prior Publication US 2023/0117534 A1, Apr. 20, 2023
Int. Cl. G02F 1/035 (2006.01); G02F 1/025 (2006.01); G02F 1/225 (2006.01); H01L 21/3105 (2006.01)
CPC G02F 1/035 (2013.01) [G02F 1/025 (2013.01); G02F 1/2257 (2013.01); H01L 21/31055 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method for manufacturing an electro-optical device, comprising the steps of:
providing a waveguide (3) (step S1);
fabricating a planarization coat (7) overlapping at least a section of the waveguide (3) by applying a coating material (step S2);
providing the planarization coat (7) with a spin-on-glass coating (9) (step S3);
carrying out a dry chemical etching treatment (step S4) at least in the region of the spin-on-glass coating (9), in the course of which etching is carried out down to the planarization coat (7) and the spin-on-glass coating (9) and part of the planarization coat (7) are removed, the steps of providing the planarization coat (7) with the spin-on-glass coating (9) and the etching treatment are repeated at least once (steps S5, S6), and wherein the step of fabricating of the planarization coat, the step of providing the spin-on glass coating, and subsequent etching treatment are carried out in such a way that the a coat thickness of the planarization coat (7) above the waveguide (3) or at least a section thereof is less than or equal to 50 nm, and
providing (step S7) an active element (10) on or above the planarization coat (7) and above the waveguide (3), wherein the active element (10) comprises at least one material, which absorbs electromagnetic radiation of at least one wavelength and generates an electric photosignal as a result of the absorption and/or whose refractive index changes as a function of a voltage and/or a presence of charges and/or an electric field.