| CPC C23C 16/4584 (2013.01) [C23C 16/4408 (2013.01); H01L 21/67051 (2013.01); H01L 21/68785 (2013.01)] | 19 Claims |

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1. A wet clean chamber, comprising:
a deck plate;
a substrate support that is rotatable and configured to support a substrate;
a rotor disposed about and configured to rotate with the substrate support, wherein the rotor includes an upper fluid collection region disposed radially outward of the substrate support in position to collect fluid leaving the substrate support during processing, and wherein the upper fluid collection region includes a plurality of drain openings along a radially outward perimeter of a bottom of the upper fluid collection region, wherein the rotor includes an annular base plate and an outer wall having an upper portion extending upward and radially inward from an outer perimeter of the annular base plate and a lower portion extending downward and radially outward from the annular base plate, wherein the rotor includes a first annular lip extending upward from the annular base plate, and wherein the substrate support includes an outer annular lip that extends downward from a body of the substrate support and surrounds the first annular lip;
a stationary housing surrounding the rotor and having a lower fluid collection region disposed beneath the drain openings of the rotor and having one or more exhaust ports fluidly coupled to the lower fluid collection region, wherein the lower fluid collection region is disposed above the deck plate; and
one or more fluid delivery arms coupled to the deck plate and configured to deliver fluid to the substrate.
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