| CPC C23C 14/28 (2013.01) [C03C 17/22 (2013.01); C23C 14/0635 (2013.01); C23C 14/0652 (2013.01); C03C 2217/281 (2013.01); C03C 2217/282 (2013.01); C03C 2218/151 (2013.01)] | 8 Claims |

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1. A method of an ultrafast-pulsed laser deposition, comprising:
step 1: after splitting a femtosecond-pulsed laser beam, focalizing split femtosecond-pulsed laser beams to form a plasma channel based on a nonlinear effect and to generate a femtosecond laser filament; synchronizing the femtosecond-pulsed laser beam by delay synchronization processing so as to form a plasma grating or a plasma lattice by the femtosecond laser filament coupled with each other non-collinearly and crossly; and exciting a target material with the plasma grating or the plasma lattice;
step 2: emitting multiple ultrafast-pulsed laser beams as post pulses; coupling the post pulses with the plasma grating or the plasma lattice sequentially, by controlling a first delay between the post pulses and the plasma grating or the plasma lattice and a second delay between the post pulses thereof, so as to form a regenerated plasma grating or a regenerated plasma lattice with multi-stage cascade in a time domain; and exciting the target material for multiple times; and
step 3: exciting and ablating the target material by adjusting the ultrafast-pulsed laser beams coupled with the regenerated plasma grating or the regenerated plasma lattice, to form a thin film with a required thickness by a deposition of ablated particles on a substrate, by controlling the time.
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