	US 12,460,132 B2
	Method for supplying composition, composition and dry etching method
Takahisa Taniguchi, Ube (JP); Hiroyuki Oomori, Ube (JP); and Akifumi Yao, Ube (JP)
Assigned to CENTRAL GLASS COMPANY, LIMITED, Yamaguchi (JP)
Appl. No. 17/921,171
Filed by CENTRAL GLASS COMPANY, LIMITED, Ube (JP)
PCT Filed Apr. 27, 2021, PCT No. PCT/JP2021/016722 § 371(c)(1), (2) Date Oct. 25, 2022, PCT Pub. No. WO2021/221036, PCT Pub. Date Nov. 4, 2021.
Claims priority of application No. 2020-079683 (JP), filed on Apr. 28, 2020.
Prior Publication US 2023/0167361 A1, Jun. 1, 2023
Int. Cl. C09K 13/08 (2006.01); H01L 21/311 (2006.01)

CPC C09K 13/08 (2013.01) [H01L 21/31116 (2013.01)]

10 Claims

1. A method for supplying a composition comprising:

keeping a storage container that encloses a composition therein at a constant temperature of 10° C. or higher to supply a gas of the composition to a predetermined device,

wherein the composition contains, in a gaseous phase, trimethylamine, dimethylethylamine, and at least one of dimethylamine or monomethylamine, and

wherein the composition contains, in the gaseous phase, the trimethylamine in an amount of 95% by volume or more.