US 12,459,826 B2
Hollow silica particles and method for manufacturing hollow silica particles
Toshiya Matsubara, Tokyo (JP); Hyunji Kim, Tokyo (JP); Hajime Katayama, Tokyo (JP); and Yusuke Arai, Tokyo (JP)
Assigned to AGC Inc., Tokyo (JP); and AGC SI-TECH CO., LTD., Kitakyushu (JP)
Filed by AGC Inc., Tokyo (JP); and AGC SI-TECH CO., LTD., Kitakyushu (JP)
Filed on Aug. 19, 2022, as Appl. No. 17/891,320.
Application 17/891,320 is a continuation of application No. PCT/JP2021/006697, filed on Feb. 22, 2021.
Claims priority of application No. 2020-032046 (JP), filed on Feb. 27, 2020; application No. 2020-161378 (JP), filed on Sep. 25, 2020; and application No. 2020-161379 (JP), filed on Sep. 25, 2020.
Prior Publication US 2022/0411275 A1, Dec. 29, 2022
Int. Cl. C01B 33/18 (2006.01); C09C 1/30 (2006.01)
CPC C01B 33/18 (2013.01) [C09C 1/3027 (2013.01); C09C 1/3081 (2013.01); C01P 2002/82 (2013.01); C01P 2004/34 (2013.01); C01P 2004/61 (2013.01); C01P 2004/64 (2013.01); C01P 2006/10 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A hollow silica particle comprising:
a shell layer containing silica; and
a space formed inside the shell layer,
wherein the hollow silica particle has a particle density as measured by a dry pycnometer density measurement using helium gas of 2.00 g/cm3 or more and a particle density as measured by a dry pycnometer density measurement using oxygen gas of lower than 2.00 g/cm3.