US 12,459,271 B2
Liquid discharge apparatus, substrate processing apparatus and article manufacturing method
Shugo Nakayama, Tokyo (JP); Tomofumi Nishikawara, Tochigi (JP); Akiko Iimura, Tochigi (JP); Masahiro Kuri, Tochigi (JP); and Tetsuya Yamamoto, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Sep. 15, 2023, as Appl. No. 18/468,010.
Claims priority of application No. 2022-153999 (JP), filed on Sep. 27, 2022.
Prior Publication US 2024/0100853 A1, Mar. 28, 2024
Int. Cl. B41J 2/18 (2006.01); B41J 2/045 (2006.01); B41J 2/145 (2006.01)
CPC B41J 2/18 (2013.01) [B41J 2/04505 (2013.01); B41J 2/145 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A liquid discharge apparatus comprising:
a head configured to discharge a liquid;
a chamber configured to contain the head;
a circulation system configured to circulate a gas inside the chamber;
an exhaust system configured to operate to exhaust the gas to an outside of the chamber;
a filter provided in the circulation system and configured to remove a removal target contained in the gas;
a detection unit configured to indirectly detect the removal target by detecting a detection target that is contained in the gas and different from the removal target; and
a controller configured to operate the exhaust system when a concentration of the detection target detected by the detection unit is not lower than a threshold.