US 12,459,058 B2
Laser processing head having contamination resistance
Romon Chakrabarti, Berlin (DE); Danny Chan, Berlin (DE); Patrick Kühl, Berlin (DE); Hannes Noack, Ludwigsfelde (DE); Georg Schmidt, Stahnsdorf (DE); and Alexander Müller, Ahrensfelde (DE)
Assigned to II-VI DELAWARE, INC., Wilmington, DE (US)
Filed by II-VI Delaware, Inc, Wilmington, DE (US)
Filed on Sep. 24, 2021, as Appl. No. 17/448,826.
Prior Publication US 2023/0095918 A1, Mar. 30, 2023
Int. Cl. B23K 26/38 (2014.01); B23K 26/06 (2014.01); B23K 26/12 (2014.01); B23K 26/142 (2014.01)
CPC B23K 26/38 (2013.01) [B23K 26/0643 (2013.01); B23K 26/0648 (2013.01); B23K 26/128 (2013.01); B23K 26/142 (2015.10)] 24 Claims
OG exemplary drawing
 
1. A laser processing head for directing a laser beam, the head comprising:
a housing having an interior for passage of the laser beam along an optical axis from an inlet to an outlet;
at least one reflector disposed in the interior of the housing and reflecting the laser beam along the optical axis between the inlet and the outlet;
a lens element disposed in the interior of the housing, the lens element being movable along the optical axis and being configured to adjust a focal length of the laser beam;
one or more nozzles configured to direct purge gas across one or more of the at least one reflector and the lens element; and
one or more collection areas disposed in the interior of the housing and configured to collect contamination directed from the purge gas,
wherein at least one collection area of the one or more collection areas is disposed adjacent the lens element and downstream from the one or more nozzles, and the at least one collection area is disposed upstream and spaced from the outlet of the housing.