US 12,458,574 B2
Deposition system for hair
Colin Christopher David Giles, Wirral (GB); and Rongrong Zhou, Wirral (GB)
Assigned to Conopco, Inc., Englewood Cliffs, NJ (US)
Appl. No. 17/413,104
Filed by Conopco, Inc., Englewood Cliffs, NJ (US)
PCT Filed Dec. 18, 2019, PCT No. PCT/EP2019/086032
§ 371(c)(1), (2) Date Jun. 11, 2021,
PCT Pub. No. WO2020/127542, PCT Pub. Date Jun. 25, 2020.
Claims priority of application No. 18213912 (EP), filed on Dec. 19, 2018.
Prior Publication US 2022/0023178 A1, Jan. 27, 2022
Int. Cl. A61K 8/41 (2006.01); A61Q 5/12 (2006.01)
CPC A61K 8/416 (2013.01) [A61Q 5/12 (2013.01)] 20 Claims
 
1. A hair treatment composition comprising:
a) a conditioning base comprising:
i) 0.1 to 7.5 wt % of a cationic conditioning surfactant comprising cetyltrimethylammonium chloride, behenyltrimethylammonium chloride, or mixtures thereof;
ii) 0.1 to 8 wt % of a fatty alcohol comprising cetyl alcohol, stearyl alcohol, or mixtures thereof;
b) from 0.5 to 5 wt % of a conditioning silicone selected from the group consisting of dimethicone, dimethiconol, amodimethicone, and mixtures thereof; and
c) from 0.1 to 2 wt % of a diesterquat selected from bis (isostearoyl/oleoyl isopropyl) dimonium methosulfate, dioleoylisopropyl dimonium methosulfate, and mixtures thereof;
wherein the wt ratio of b) to c) is from 1:1 to 1:0.1 and results in a higher silicone deposition than in the absence of the diesterquat.