US 12,457,918 B2
Targeted fluid/solid dispensing based on sensed seed data or sensed plant data
Jason Stoller, Eureka, IL (US); Ben L. Schlipf, Tremont, IL (US); and Justin McMenamy, Edwards, IL (US)
Assigned to Precision Planting LLC, Tremont, IL (US)
Filed by Precision Planting LLC, Tremont, IL (US)
Filed on Nov. 29, 2023, as Appl. No. 18/522,704.
Application 18/522,704 is a division of application No. 16/642,327, granted, now 11,864,487, previously published as PCT/US2018/049540, filed on Sep. 5, 2018.
Claims priority of provisional application 62/554,448, filed on Sep. 5, 2017.
Claims priority of provisional application 62/567,715, filed on Oct. 3, 2017.
Prior Publication US 2024/0094180 A1, Mar. 21, 2024
Int. Cl. A01C 7/06 (2006.01); A01B 47/00 (2006.01); A01C 7/10 (2006.01); A01C 23/00 (2006.01); A01C 23/02 (2006.01)
CPC A01C 7/06 (2013.01) [A01B 47/00 (2013.01); A01C 7/105 (2013.01); A01C 23/007 (2013.01); A01C 23/02 (2013.01); A01C 23/023 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A planter system comprised of planting seeds and applying a material comprising:
a seeding meter for dispensing seed through a seed tube or other device into a furrow;
a sensor to detect seed or seed frequency including sensed seed pulses;
a material application system to apply the material in response to receiving a signal that is based on the sensed seed pulses, the material application system to apply the material through wing nozzles of a furrow device into sidewalls of the furrow, and to apply the material through at least one of center nozzles of the furrow device into the furrow, a fluid applicator having at least one sidewall injection conduit for material application into one or more sidewalls of the furrow, a seed firmer having at least one sensor, a knife disposed adjacent to the furrow, and a coulter disposed adjacent to the furrow; and
a control system to use the sensed seed pulses to command the material application system to apply the material either by synchronizing with the seed pulses or a direct relationship between a sensed seed pulse and pulsed material application.