US 12,133,319 B2
Apparatus and method for generating extreme ultraviolet radiation
Ting-Ya Cheng, Taipei (TW); Chun-Lin Chang, Zhubei (TW); Li-Jui Chen, Hsinchu (TW); and Han-Lung Chang, Kaohsiung (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Dec. 27, 2021, as Appl. No. 17/562,819.
Application 17/562,819 is a continuation of application No. 16/551,294, filed on Aug. 26, 2019, granted, now 11,212,903, issued on Dec. 28, 2021.
Claims priority of provisional application 62/725,931, filed on Aug. 31, 2018.
Prior Publication US 2022/0124901 A1, Apr. 21, 2022
Int. Cl. H05G 2/00 (2006.01); G02B 7/185 (2021.01); G02B 26/06 (2006.01); G02B 26/08 (2006.01); G02B 27/09 (2006.01); G03F 7/00 (2006.01)
CPC H05G 2/008 (2013.01) [G02B 7/185 (2013.01); G02B 26/06 (2013.01); G02B 26/0858 (2013.01); G02B 27/0933 (2013.01); G02B 27/0977 (2013.01); G03F 7/70033 (2013.01); H05G 2/005 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for generating extreme ultraviolet (EUV) radiation, the apparatus comprising:
an excitation laser configured to heat target droplets using excitation pulses to convert the target droplets to plasma;
a deformable mirror comprising a plurality of regions that are selectively controlled to deform; and
a controller configured to control the deformable mirror based on a feedback parameter comprising a spatial separation between a pre-pulse of the excitation laser and a main pulse of the excitation laser.