US 12,131,918 B2
Substrate processing apparatus
Sang Min Lee, Seoul (KR); Seung Hoon Oh, Cheonan-si (KR); Yong Joon Im, Yongin-si (KR); and Hyo Won Yang, Seoul (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Feb. 8, 2022, as Appl. No. 17/667,459.
Claims priority of application No. 10-2021-0040673 (KR), filed on Mar. 29, 2021.
Prior Publication US 2022/0305536 A1, Sep. 29, 2022
Int. Cl. H01L 21/67 (2006.01); B08B 3/04 (2006.01); F26B 5/00 (2006.01)
CPC H01L 21/67028 (2013.01) [H01L 21/67023 (2013.01); B08B 3/04 (2013.01); F26B 5/005 (2013.01); H01L 21/6719 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a process chamber comprising a first body with a top surface, a side surface, and a first protrusion portion extending outwardly from the side surface and a second body with a second protrusion portion at an upper portion of the second body, wherein the first protrusion portion and the second protrusion portion are coupled with each other, and wherein a processing space is defined by the first body and the second body coupled with each other and a top surface of the first protrusion is connected to the side surface and is lower than the top surface of the first body;
a clamping member configured to clamp the first protrusion portion of the first body and the second protrusion portion of the second body;
an anti-friction member mounted in a groove formed at a contact region between the clamping member and at least one of the first body and the second body; and
a fastening member disposed in the contact region and configured to fix the anti-friction member at the contact region.