| CPC G03F 9/7011 (2013.01) [G03F 9/7019 (2013.01)] | 14 Claims |
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12. An exposure apparatus for exposing a plurality of regions on a substrate via an original, comprising:
a processing unit configured to obtain an array of the plurality of regions on the substrate; and
a stage configured to position the substrate based on the array obtained by the processing unit,
wherein the processing unit
obtains, using a prior distribution representing a probability distribution of parameters of a regression model used to estimate the array, a first posterior distribution representing the probability distribution of the parameters from first position measurement data of marks assigned to a first number of sample regions in the plurality of regions on a first substrate;
obtains, using the first posterior distribution as the prior distribution representing the probability distribution of the parameters, a second posterior distribution representing the probability distribution of the parameters from second position measurement data of marks assigned to a second number of sample regions in a plurality of regions on a second substrate to be processed after the first substrate, the second number being smaller than the first number; and
updates the regression model by deciding the parameters based on the second posterior distribution and obtains, using the updated regression model, the array of the plurality of regions on the second substrate from the second position measurement data.
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