US 12,130,552 B2
Composition for resist underlayer, and pattern forming method using same
Yoojeong Choi, Suwon-si (KR); Soonhyung Kwon, Suwon-si (KR); Minsoo Kim, Suwon-si (KR); Hyeon Park, Suwon-si (KR); Shinhyo Bae, Suwon-si (KR); and Jaeyeol Baek, Suwon-si (KR)
Assigned to Samsung SDI Co., Ltd., Yongin-si (KR)
Appl. No. 17/419,657
Filed by Samsung SDI Co., Ltd., Yongin-si (KR)
PCT Filed Mar. 23, 2020, PCT No. PCT/KR2020/003965
§ 371(c)(1), (2) Date Jun. 29, 2021,
PCT Pub. No. WO2020/204431, PCT Pub. Date Oct. 8, 2020.
Claims priority of application No. 10-2019-0037030 (KR), filed on Mar. 29, 2019.
Prior Publication US 2022/0075266 A1, Mar. 10, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/11 (2006.01); G03F 7/004 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01)
CPC G03F 7/11 (2013.01) [G03F 7/0045 (2013.01); G03F 7/091 (2013.01); G03F 7/092 (2013.01); G03F 7/094 (2013.01); G03F 7/162 (2013.01)] 14 Claims
 
1. A resist underlayer composition, comprising
a polymer comprising a structure represented by Chemical Formula 1 at the terminal end and a structural unit represented by Chemical Formula 2 and a structural unit represented by Chemical Formula 3 in the main chain; and
a solvent:

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
wherein, in Chemical Formula 1 to Chemical Formula 3,
L1 to L7 are independently a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C1 to C30 heteroalkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C2 to C20 heterocycloalkylene group, a substituted or unsubstituted C1 to C30 heteroalkenylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C2 to C30 alkenylene group, a substituted or unsubstituted C2 to C30 alkynylene group, or a combination thereof,
A, B, C, and D are independently O, S, S(O2), C(O), C(O)O, NRa, or C(O)NRb,
at least one of B, C, and D is S,
n1, n2, n3, and n4 are independently one of integers of 0 to 3, provided that at least one of n2, n3, and n4 is an integer of 1 or more,
Ra, Rb and R1 to R3 are independently hydrogen, deuterium, a hydroxy group, a thiol group, a halogen, a carboxyl group, acetyl group, an amino group, a cyano group, a nitro group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C1 to C10 alkoxy group, a substituted or unsubstituted C1 to C30 acyl group, or a combination thereof, and
* is a linking point.