US 12,129,548 B2
Method of forming structures using a neutral beam
Tomohiro Kubota, Hachioji (JP); Mitsuya Utsuno, Tachikawa (JP); Toshihisa Nozawa, Kawasaki (JP); Seiji Samukawa, Sendai (JP); and Hua Hsuan Chen, Sendai (JP)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Apr. 5, 2023, as Appl. No. 18/130,959.
Application 18/130,959 is a continuation of application No. 16/930,211, filed on Jul. 15, 2020, granted, now 11,643,724.
Claims priority of provisional application 62/875,892, filed on Jul. 18, 2019.
Prior Publication US 2023/0250531 A1, Aug. 10, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/48 (2006.01); H05H 3/02 (2006.01)
CPC C23C 16/45536 (2013.01) [C23C 16/402 (2013.01); C23C 16/45553 (2013.01); C23C 16/486 (2013.01); H05H 3/02 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method of forming a structure in a reaction chamber, the method comprising the steps of:
forming a layer on a surface of a substrate using one or more of NBEALD or NBECVD;
forming a neutral beam generated from one or more gases; and
exposing the layer on the surface of the substrate to species generated from the neutral beam,
wherein a neutral beam apparatus comprising an aperture plate is used to form the neutral beam, and wherein the step of exposing the layer further comprises applying a bias power density to the aperture plate.