US 12,129,392 B2
Resin composition for imprinting
Yuki Sugiura, Hyogo (JP); and Yohei Uetsuki, Hyogo (JP)
Assigned to Nagase ChemteX Corporation, Osaka (JP)
Appl. No. 17/627,051
Filed by NAGASE CHEMTEX CORPORATION, Osaka (JP)
PCT Filed Jul. 13, 2020, PCT No. PCT/JP2020/027278
§ 371(c)(1), (2) Date Jan. 13, 2022,
PCT Pub. No. WO2021/015044, PCT Pub. Date Jan. 28, 2021.
Claims priority of application No. 2019-136038 (JP), filed on Jul. 24, 2019.
Prior Publication US 2022/0267638 A1, Aug. 25, 2022
Int. Cl. C09D 183/04 (2006.01); C08K 3/22 (2006.01); C08K 5/5419 (2006.01); C08L 83/04 (2006.01); B29C 59/02 (2006.01); B29K 83/00 (2006.01); B29K 105/16 (2006.01); B29K 509/02 (2006.01)
CPC C09D 183/04 (2013.01) [C08K 3/22 (2013.01); C08K 5/5419 (2013.01); C08L 83/04 (2013.01); B29C 59/022 (2013.01); B29K 2083/00 (2013.01); B29K 2105/162 (2013.01); B29K 2509/02 (2013.01); B29K 2995/0088 (2013.01); C08K 2003/2237 (2013.01); C08K 2003/2244 (2013.01)] 8 Claims
 
1. A resin composition for imprinting, comprising:
(A) a polysiloxane resin represented by the following formula (1):
(R1SiO3/2)a(R22SiO2/2)b(R33SiO1/2)c(SiO4/2)d  (1),
wherein R1, R2, and R3 are each independently a hydrogen atom, a hydroxy group, an alkoxy group, a C1-C12 hydrocarbon group, or a C1-C12 substituent having one or more crosslinkable functional groups, with at least one of R1, R2, or R3 being a C1-C12 substituent having one or more crosslinkable functional groups, and when a plurality of R1s, R2s, or R3s are present, they may be different from one another; and
a, b, c, and d are numbers satisfying the following conditions: 0.001≤a≤1.00, 0≤b≤0.999, 0≤c≤0.30, 0≤d≤0.30, and a+b+c+d=1.0;
(B) a fine particulate inorganic oxide;
an alkoxysilane compound; and
optionally a curable resin,
wherein a ratio by weight of a sum of the polysiloxane resin (A), the alkoxysilane compound, and the optional curable resin when present, to the fine particulate inorganic oxide (B) is 0.2 to 2.5, and a solid content of the resin composition is 10 to 85 wt %.
 
8. A method of producing an imprinted substrate, the method comprising:
coating a substrate with the resin composition for imprinting according to claim 1; and
patterning the coated substrate by nanoimprinting.