US 12,129,240 B2
Sulfonium salt, photoacid generator, curable composition and resist composition
Takuto Nakao, Kyoto (JP)
Assigned to SAN-APRO LTD., Kyoto (JP)
Appl. No. 17/419,504
Filed by SAN-APRO LTD., Kyoto (JP)
PCT Filed Dec. 16, 2019, PCT No. PCT/JP2019/049093
§ 371(c)(1), (2) Date Jun. 29, 2021,
PCT Pub. No. WO2020/145043, PCT Pub. Date Jul. 16, 2020.
Claims priority of application No. 2019-002370 (JP), filed on Jan. 10, 2019.
Prior Publication US 2022/0089562 A1, Mar. 24, 2022
Int. Cl. G03F 7/004 (2006.01); C07D 333/78 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01)
CPC C07D 333/78 (2013.01) [G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01)] 16 Claims
 
1. A sulfonium salt of formula (1):

OG Complex Work Unit Chemistry
wherein R1 is a thioxanthonyl group; R2 is a phenyl group, wherein at least one hydrogen atom in the phenyl group is replaced by a substituent (t); the substituent (t) is at least one selected from the group consisting of a C1-C18 alkyl group and a C1-C18 alkoxy group; R3, R4 and R5 are each independently an alkyl group or an alkoxy group; k, m, and n respectively are the numbers of R3, R4, and R5; k is 0; m is 0; n is an integer of 1 to 4;
A is a —O— group, a —S— group, a —SO— group, a —SO2— group, or a —CO— group; O is an oxygen atom; S is a sulfur atom; and X− is a monovalent polyatomic anion.