US 12,128,627 B2
Method and device for post-treatment of particles carried in a process gas and filter therefor
Ulrich Kleinhans, Prittriching (DE); Philip Stroebel, Weidenbach (DE); Sven Pawliczek, Gilching (DE); and Johannes Rumpel, Dasing (DE)
Assigned to EOS GmbH Electro Optical Systems, Krailling (DE)
Appl. No. 17/299,016
Filed by EOS GmbH Electro Optical Systems, Krailling (DE)
PCT Filed Dec. 11, 2019, PCT No. PCT/EP2019/084749
§ 371(c)(1), (2) Date Jun. 2, 2021,
PCT Pub. No. WO2020/120623, PCT Pub. Date Jun. 18, 2020.
Claims priority of application No. 102018221575.8 (DE), filed on Dec. 12, 2018.
Prior Publication US 2022/0118513 A1, Apr. 21, 2022
Int. Cl. B29C 64/371 (2017.01); B01D 46/00 (2022.01); B22F 1/142 (2022.01); B22F 1/16 (2022.01); B22F 10/77 (2021.01); B33Y 40/20 (2020.01)
CPC B29C 64/371 (2017.08) [B01D 46/0093 (2013.01); B22F 1/142 (2022.01); B22F 1/16 (2022.01); B22F 10/77 (2021.01); B22F 2201/10 (2013.01); B22F 2202/11 (2013.01); B33Y 40/20 (2020.01)] 16 Claims
OG exemplary drawing
 
1. A method for a post-treatment of particles carried along in a process gas of a device for the generative manufacturing of three-dimensional objects, comprising:
conducting the particles to a filter chamber via a supply of the process gas;
adding an oxidant to the particles, wherein the oxidant is supplied to a particle environment and/or is present in a particle environment which is formed by the process gas, the oxidant being added to the particles prior to the particles reaching the filter chamber or within the filter chamber;
initiating an oxidation reaction of the particles with the oxidant; and
recirculating the process gas,
wherein the process gas is a gas discharged from a process chamber of the device for the generative manufacturing.